MICROSTRUCTURAL CHARACTERISTICS AND ELECTRICAL CONDUCTIVITY OF CUO THIN FILMS DEPOSITED ON DIELECTRIC SUBSTRATES

Authors

  • Fazliddin Arzikulov Researcher of Tashkent State Technical University named after Islam Karimov, Assistant at Tashkent State Medical University, Tashkent, Uzbekistan
  • Asror Mustafakulov Professor of the Department of Physics, Jizzakh Polytechnic Institute, Uzbekistan
  • Isroil Kosimov Senior Researcher at the O.S. Sodikov Institute of Bioorganic Chemistry, Academy of Sciences of the Republic of Uzbekistan, 100143, Uzbekistan
  • Sherzod Kuchkanov PhD in Technical Sciences, Associate Professor of Tashkent State Technical University named after Islam Karimov

Keywords:

CuO thin films, ion-plasma deposition, microstructure, electrical conductivity, semiconductor materials, dielectric substrate, crystal structure, electrophysical properties.

Abstract

Copper oxide (CuO) thin films have attracted considerable scientific interest due to their unique semiconductor properties, narrow band gap, high optical absorption coefficient, and potential applications in optoelectronics, photovoltaics, gas sensors, and energy storage devices. The structural and electrical characteristics of CuO thin films strongly depend on deposition technology, substrate properties, and growth conditions.

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Published

2026-05-26

Issue

Vol. 41 (2026): Global Congress

Section

Articles

How to Cite

MICROSTRUCTURAL CHARACTERISTICS AND ELECTRICAL CONDUCTIVITY OF CUO THIN FILMS DEPOSITED ON DIELECTRIC SUBSTRATES. (2026). E Global Congress, 41, 30-39. https://eglobalcongress.com/index.php/egc/article/view/457